Transient characteristics simulation of total ionizing dose effect on Si n-metal-oxide-semiconductor field effect transistor under different gate voltage

نویسندگان

چکیده

In this work, we establish a novel numerical model of total ionizing dose effect and use it to simulate the radiation degradation Si n- metal-oxide-semiconductor field transistor (NMOSFET) under different bias voltages. The is based on capture/emission process traps, used transient characteristics semiconductor devices effect. simulation, changes trapped holes in Si/SiO<sub>2</sub> interface gate oxide layer are extracted, found that number at positions tends be saturated with increase dose. When voltage positive, amplitude threshold significantly higher than when negative. Whether applied positive or negative during radiation, shows trend first increasing then decreasing absolute value voltage. Radiation also has certain annealing after radiation. If device annealing, electrical recovery lower zero

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ژورنال

عنوان ژورنال: Chinese Physics

سال: 2023

ISSN: ['1000-3290']

DOI: https://doi.org/10.7498/aps.72.20230207